| 摘要 |
<p>PURPOSE:To enhance the display quality of a formed display panel by overcoating a substrate provided with an electrode with an insulating inorg. thin film and diagonally vapor-depositing SiO to make the pretilt angle of the vapor-deposited film uniform over the whole region of the substrate. CONSTITUTION:For example, TiCl4 is vapor-deposited by a CVD method on a soda lime glass substrate 1 provided with a transparent electrode 2 made of tin oxide to form an insulating inorg. thin film 3 made of TiO2 in about 200Angstrom thickness, and SiO is diagonally vapor-deposited at about 80 deg. angle theta of deposition to form a diagonally vapor-deposited film 4 having a uniform pretilt angle alpha (about 60 deg.) over the whole surface of the substrate 1. In the figure, symbol 5 is each liq. crystal molecule oriented on the substrate, and 6 is the direction of the diagonal vapor deposition.</p> |
