发明名称 MASK FOR X-RAY EXPOSURE
摘要 <p>PURPOSE:To make a surface area of a light-shielding part large, to increase a heat-dissipating effect and to prevent a bad influence by thermal expansion or the like by a temperature rise of the light-shielding part by a method wherein the light-shielding part shielding X-rays is formed on an X-ray transmitting substrate and an uneven part is formed on the surface of the light-shielding part. CONSTITUTION:A light-shielding part shielding X-rays is formed on an X-ray transmitting substrate 3; an uneven part 2 is formed on the surface of the light- shielding part 1. Since the uneven part 2 is formed on the surface of the light- shielding part 1 of a mask, a surface area of the light-shielding part is made large; an area in which the light-shielding part 1 comes into contact with the outside is made large, generated heat 5 is dissipated easily. Thereby, a temperature rise of the light-shielding part is suppressed, and thermal expansion of the mask is suppressed. As a result, a good patterning operation can be achieved. When the size of the uneven part 2 is made as small as possible, heat-dissipating effect can be increased.</p>
申请公布号 JPH03156912(A) 申请公布日期 1991.07.04
申请号 JP19890296774 申请日期 1989.11.15
申请人 SONY CORP 发明人 SOMEYA ATSUSHI
分类号 G03F1/22;G03F1/54;G03F7/20;H01L21/027 主分类号 G03F1/22
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