METHOD OF EXPOSING PATTERNS OF SEMICONDUCTOR DEVICES AND STENCIL MASK FOR CARRYING OUT SAME

摘要

A method of exposing a semiconductor device pattern onto a semiconductor substrate by repeatedly exposing in an adjoining arrangement a plurality of unit patterns (2) obtained by dividing at least part of a device pattern, thereby connecting the unit patterns to complete the part of the device pattern on the substrate, which includes: dividing at least part of a device pattern into a plurality of unit patterns; preparing a stencil mask provided with transmitting openings having shapes conforming to the respective unit patterns, pattern lines of which to be connected with each other bridging the adjoining unit patterns have at least one connecting end provided with at least one protrusion (14) having a width less than that of the corresponding pattern lines; placing the stencil mask in.an optical arrangement for projecting the unit patterns onto the substrate; irradiating a beam of charged particles or light through one of the openings for exposing one corresponding unit pattern onto the predetermined sites of the substrate; and repeating the irradiation through other openings for exposing the respective corresponding unit patterns onto the respective predetermined sites of the substrate until the part of the device pattern is completely transferred onto the substrate. Also disclosed is a stencil mask for carrying out the present inventive method.