| 摘要 |
PURPOSE:To inspect a foreign matter on a pellicle plane loaded on a photomask and to improve elimination efficiency and working efficiency when it is eliminated by providing a mechanism to eliminate the foreign matter by spraying pressurized gas. CONSTITUTION:The foreign matter 23 is moved just underneath a nozzle 25 by moving a movable stage 24 on which the photomask 21 loading a pellicle 22 is held in X and Y directions according to the position coordinate of the foreign matter 23 on the pellicle 22 detected by foreign matter inspection, and the foreign matter 23 is eliminated by spraying cleaned or pressurized nitrogen gas 26 with a filter. Thereby, it is not required to draw out the photomask outside the device to eliminate a detected foreign matter, and to prevent the re-attachment of the foreign matter occurring on the pellicle plane 22 generated until the photomask is set again on the foreign matter inspecting device for confirmation after the removal of the foreign matter, which improves the elimination efficiency of the foreign matter. |
