发明名称 ALIGNMENT MECHANISM IN PREPOSITION OF AUTOMATIC SURFACE GRINDER
摘要 PURPOSE:To dismantle without receiving any effect of the surface tension of water even in the case of a diameter expanding semiconductor wafer and also to perform the alignment accurately by notching a flowing water notch part reaching to the adequate position located between the upper face of a wafer mounting base and the upper end face of a wafer takeout edge part on the center side of a wafer alignment edge part. CONSTITUTION:When a water supply is continued, a semiconductor wafer A starts to float uniformly and the water level becomes upper than the lower end of a flowing water notch part 11, water is flowed out with its overflow from the water flowing notch part 11 and a water flowing is caused toward a wafer alignment edge part 10. Accordingly the semiconductor wafer A is horizontally moved in the wafer alignment edge part 10, stopped in a horizontal state with the abutment of the peripheral edge end of the semiconductor wafer on the wafer alignment edge part 10 and the alignment is completed at the position of a semiconductor wafer A'. The upper face of the semiconductor wafer A is sucked by the suction pad equipped on a transfer arm in this state.
申请公布号 JPH03154780(A) 申请公布日期 1991.07.02
申请号 JP19890288671 申请日期 1989.11.08
申请人 SHIBAYAMA KIKAI KK 发明人 SEKIDA SABURO
分类号 B23Q3/18;B24B7/00;B24B41/06;B24B55/02;H01L21/304 主分类号 B23Q3/18
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