发明名称 PHOTOMASK
摘要 PURPOSE:To facilitate the measurement of transmittivity of a pellicle installed in a photomask by providing a reflecting plate on the photomask surface of an area covered with the pellicle. CONSTITUTION:A pellicle frame 12 to which a pellicle 11 is stuck is stuck to a photomask 13, and to the outside of a patterning part 14 of the mask 13, a reflecting plate 15 is attached. In this regard, it is desirable to use a dielectric mirror for the reflecting plate 15. In such a way, by reflecting an incident light from the pellicle 11 by the reflecting plate 15, and measuring the intensity of a reflected light, transmittivity of the pellicle 11 can be calculated.
申请公布号 JPH03154054(A) 申请公布日期 1991.07.02
申请号 JP19890294619 申请日期 1989.11.13
申请人 SEIKO EPSON CORP 发明人 OGOSHI TAKESHI
分类号 G03F1/62;H01L21/027 主分类号 G03F1/62
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