| 摘要 |
PURPOSE:To reproduce a mask pattern faithfully to resist by setting the light transmissivity of the transparent part which is larger than the light shield film and is at the periphery of the light shield film smaller than the light transmissivity of the transparent part at the periphery of the smallest light shield film among light shield films. CONSTITUTION:The light shield films 3 and 4 which differ in size are adhered and formed in desired patterns on a substrate which transmits light. The light shield part 6 at the periphery of the large light shield film 3 is processed so as to decrease the light transmissivity and the quantity of light which is transmitted through the transparent part 6 and to which the resist 10 below it is exposed is set to an accurate value. Then the quantity of exposure of the photomask 1 is made constant and the quantity of exposure of the resist 10 through the transparent part 6 at the periphery of the light shield films 3 and 4 is adjusted to a proper value. Consequently, the reproducibility of the mask pattern to the resist 10 is improved uniformly. |
