发明名称 |
NEGATIVE CONTRAST PHOTORESIST DEVELOPABLE BY BASE |
摘要 |
PURPOSE: To ensure satisfactory contrast and sensitivity by using an arom. hydroxy substd. polymer, a radiation-degradable acid generating agent and a crosslinking agent having two epoxy groups per one molecule. CONSTITUTION: This photoresist contains polyhydroxystyrene, especially poly-p- hydroxystyrene or novolak such as m-cresol novolak or bisphenol A novolak as an arom. hydroxy substd. polymer, a metallic or nonmetallic onium salt or a nonmetallic precursor of sulfonic acid generating the strong acid when exposed with radiation as a radiation-degradable acid generating agent and an epoxide-contg. compd. having two epoxy groups and crosslinking the hydroxy substd. polymer in the presence of the acid generated under radiation. Satisfactory contrast is ensured without reducing sensitivity. |
申请公布号 |
JPH03152543(A) |
申请公布日期 |
1991.06.28 |
申请号 |
JP19900250421 |
申请日期 |
1990.09.21 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
UIRAADO AARU KONREE JIYUNIA;JIEFURII DONARUDO JIEROOMU;UEIN MAATEIN MOROO;SUTANREE YUUJIIN PEROORUTO;GEERII TOMASU SUPINITSURO;ROBAATO RABIN UTSUDO |
分类号 |
G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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