New tetra:silyl methane and prepn. from aryl halo-silane - and carbon tetra:halide by redn. halogenation and hydrogenation, for amorphous silicon prodn.

摘要

Tetrasilyl methane, C(SiH3)4, (I) is new. (I) is prepd. by (a) reacting arylhalosilanes of formula (II) with C tetrahalides (III) in the presence of a reducing metal (IV); (b) reacting the resultant tetrakis(arylsilyl)methane (V) with H halide (VI); and (c) reducing the trakis(halosilyl)methane (VIII) to (I) with a metal hydride (VIII); Ar = (substd) aryl pref. (substd) phenyl, the pref. substits. being 1-4C alkyl, and/or alkoxy esp. Me or MeO, pref. in the p-position to the silyl gp. X = halogen, pref. Cl and/or Br; Y = the halogen atom of (VI) pref. Br. (IV) is Mg; and (VIII) is LiAlH4. USE/ADVANTAGE - (I) is useful as (additive to) process gas for the deposition of amorphous Si and its alloys with C (a-Sicx:H) from the gas phase (CVD) or liquid films giving films with good physical properties.