| 摘要 |
PURPOSE:To form an accurate fine pattern by using a metal film of tungsten, etc., formed with a mask of an upper layer by an optical exciting depositing method. CONSTITUTION:After a mask pattern of a direct tungsten film 6 is formed on a photoresist layer 4 of a base by an optical exciting depositing method, with the film 6 as a mask the layer 4 is photosensed and developed. A thin film can accurately be formed by the selective formation of the metal film by the optical exciting depositing method, and the obtained film has high light shielding function as a satisfactory mask. Thus, similar fine pattern can accurately be formed except a 2-layer resist structure. |
