发明名称 RECOGNITION OF WAFER CARRIER
摘要 <p>PURPOSE:To enable a wafer to be machined and a wafer carrier to be recognized regardless of the state of the surface of the wafer carrier by burying a recognition symbol composed of a material having an X-rays transmission rate different from that of the wafer carrier into the wafer carrier. CONSTITUTION:In an identification method of a wafer carrier 2 for storing a wafer 1, a recognition symbol 3 which is made of a material having an X-rays transmission rate different from that of the wafer carrier 2 is buried into the wafer carrier 2, X rays 5 are irradiated, and the above recognition symbol 3 is detected for enabling the wafer carrier 2 to be recognized. For example, the recognition symbol 3 consisting of characters and numbers which are made of a material having an X-rays transmission rate different from that of the wafer carrier 2 is buried into an arbitrary part of the wafer carrier 2. Then, the X rays 5 generated from an X-rays generation source 4 are irradiated to the part of the recognition symbol 3 to enable the transmission image to be reflected onto a fluorescent plate 6. The wafer carrier 2 is recognized by confirming the information of the recognition symbol 3 consisting of characters and numbers based on the transmitted image which is reflected onto the fluorescent plate 6.</p>
申请公布号 JPH03149848(A) 申请公布日期 1991.06.26
申请号 JP19890289474 申请日期 1989.11.07
申请人 SEIKO EPSON CORP 发明人 MACHIDA KAZUMASA
分类号 H01L21/68 主分类号 H01L21/68
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