| 摘要 |
A substantially closed processing station designed to disperse chemicals for uniformly coating or otherwise contacting an emulsion-coated or other surface is disclosed. The station includes opposed chemical chambers, each of which is covered with a perforated film and, optionally, a screen-like material, between which materials the photographic film or other substrate passes. Distension of the upper perforated film ensures contact between the film (or the screen) and the photographic film moving through the station while minimizing the pressure on and resulting abrading of the substrate's surface. Because the matched peripheries of the upper and lower chambers are closely fitted, the processing station is virtually sealed from the surrounding atmosphere and little degradation of the processing chemicals occurs even after extended periods of nonuse. |
