Deposition apparatus and method for manufacturing a mono-crystalline oxide superconductor thin film.

摘要

A deposition apparatus for manufacturing a monocrystalline oxide superconductor thin film comprising (a) a vacuum chamber, (b) a substrate arranged in said vacuum chamber, (c) a plurality of deposition sources arranged in said vacuum chamber opposite to said substrate, (d) a shutter arranged between the substrate and the deposition sources, (e) an oxygen supplier arranged near said substrate, said oxygen supplier having a plurality of nozzles directed to the surface of the substrate in order to supply oxygen gas to the surface of the substrate.