| 摘要 |
PURPOSE:To prevent an improper etching, etc., due to rinsing malfunction by using a megasonic nozzle when conducting rinsing with pure water after developing. CONSTITUTION:A predetermined quantity of developer is dropped from a developer nozzle 3 through a developer pipe 4, and developing is executed for predetermined time (about 1min) in a state that the developer is raised on the entire wafer 2. When the developing is then finished, pure water 6 is fed from a megasonic nozzle 5, the nozzle 5 is simultaneously driven by a megasonic nozzle driving power source 8, megasonic vibration is applied to the pure water, the wafer 2 is simultaneously rotated to rinse the entire wafer. Then, after it is rinsed for predetermined time, the water 6 is stopped, the wafer 2 is then rotated at a high speed to dry the wafer 2. Thus, improper etching due to rinsing malfunction can be prevented. |
