发明名称 |
SILICON CARBIDE-BASED MATERIAL |
摘要 |
PURPOSE:To prevent the diffusion of impurities at high temp. and to improve heat resistance and mechanical durability by treating a reacted and sintered SiC material contg. unreacted metallic Si with an acid or alkali. CONSTITUTION:A reacted and sintered SiC material having >=3.05g/cm<3> density is treated by a desired surface thickness by immersion or other method with an HF-HNO3 mixed acid or alkali such as NaOH or KOH to remove a part or all of unreacted metallic Si and a treated SiC-based material is obtd. Gaseous starting material such as CH3SiCl3 is then fed to the SiC-based material at 1,000-1,400 deg.C and an SiC-based material surface-coated with a high purity SiC coating film of >=30mum thickness by chemical vapor deposition or other method is produced. |
申请公布号 |
JPH03146470(A) |
申请公布日期 |
1991.06.21 |
申请号 |
JP19890284090 |
申请日期 |
1989.10.31 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
TAKAHATA SHIGERU;MATSUMOTO FUKUJI;HAYASHI NORIO;TAJIMA SHIGENOBU |
分类号 |
C04B35/565;C01B31/36;C04B35/56;C04B41/91 |
主分类号 |
C04B35/565 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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