发明名称 SILICON CARBIDE-BASED MATERIAL
摘要 PURPOSE:To prevent the diffusion of impurities at high temp. and to improve heat resistance and mechanical durability by treating a reacted and sintered SiC material contg. unreacted metallic Si with an acid or alkali. CONSTITUTION:A reacted and sintered SiC material having >=3.05g/cm<3> density is treated by a desired surface thickness by immersion or other method with an HF-HNO3 mixed acid or alkali such as NaOH or KOH to remove a part or all of unreacted metallic Si and a treated SiC-based material is obtd. Gaseous starting material such as CH3SiCl3 is then fed to the SiC-based material at 1,000-1,400 deg.C and an SiC-based material surface-coated with a high purity SiC coating film of >=30mum thickness by chemical vapor deposition or other method is produced.
申请公布号 JPH03146470(A) 申请公布日期 1991.06.21
申请号 JP19890284090 申请日期 1989.10.31
申请人 SHIN ETSU CHEM CO LTD 发明人 TAKAHATA SHIGERU;MATSUMOTO FUKUJI;HAYASHI NORIO;TAJIMA SHIGENOBU
分类号 C04B35/565;C01B31/36;C04B35/56;C04B41/91 主分类号 C04B35/565
代理机构 代理人
主权项
地址