| 摘要 |
<p>PURPOSE:To allow the efficient inspection of a photomask pattern alone and the this pattern superposed with another mask without erroneous recognition by forming a 1st pattern on one surface of a transparent substrate and a 2nd pattern on the other surface and inspecting both the patterns from the cross relation of the patterns by transmitted light. CONSTITUTION:After a photosensitive resin film 2 is formed on one surface of the transparent substrate 1, the photosensitive resin film 2 is irradiated with photosensitive light X by using the photomask 3 and is subjected to development processing, by which the 1st photomask pattern is formed. A photosensitive resin film 4 is then formed on the other main surface of the substrate 1 and thereafter, the photosensitive resin film 4 is irradiated with the photosensitive light Y by using the photomask 5 and is subjected to the development processing, by which the 2nd photomask pattern is formed. The inspection of two kinds of the patterns alone or in the superposed state by one sheet of the transparent substrate 1 is possible in this case while the cross relation is recognized. The efficient inspection of the photomask patterns is executed in this way with less errors.</p> |
