| 摘要 |
PURPOSE: To impart sensitivity to irradiation with near UV by incorporating a specified near UV sensitizer into a photoacid generating photoresist compsn. at such a concn. that the sensitizer can absorb enough energy to photoactivate the crosslinkable system at the time of irradiation with near UV. CONSTITUTION: A near UV sensitizer represented by formula I is incorporated into a photo-acid generating photoresist compsn. In the formula I, R is H, 1-8C alkyl or aryl, X is S, O, Se or Te, and each of R1 -R4 is H, halogen such as Cl, Br, I or F, etc., but at least one of R1 -R4 is an arom. group or R1 and R2 or R3 and R4 bond to each other to form an arom. group. Sensitivity to irradiation with near UV can be imparted to the photosetting resist system. |
