| 摘要 |
<p>PURPOSE:To obtain an ink for lithography with wide ink tack and viscosity range and easily releasing an adherent from the ink by incorporating a specified amt. of fine particles of a highly water-absorptive resin containing a specified amt. of absorbed water. CONSTITUTION:An ink compsn. for lithography contg. 3-50wt.% fine particles of a highly water-absorptive resin containing at most 50 times as much absorbed water as its own wt. The highly water-absorptive resin is not dissolved in water but absorbs such an extremely large amt. of water as 400g per gram of the resin and in addition, bead-like self-crosslinkable resin with a high water- absorbing speed is used. As the particles of the highly water-absorptive resin, spherical primary particles with a particle diameter of 5mum or smaller or particles obtd. by grinding the resin finely to a particle diameter of 5mum or smaller with a grinding machine and shifting them are used. In addition, a highly water-absorbing resin with a particle diameter of 150mum or smaller even after is absorbs about 53 times as much water as its own wt. and with a high gel strength after water absorption can be used.</p> |
