| 摘要 |
Novolak resins possessing a high glass transition temperature ("Tg") particularly suited for use in high resolution photoresist compositions are provided. The resins are prepared by the condensation reaction of formaldehyde with a multi-substituted phenol, such as for example 3,5-dimethyl phenol, a resorcinol, and optionally another phenol . Novolak resins having Tg's greater than about 120 degrees Centigrade are preferred. These novolaks are preferably prepared by the condensation reaction of formaldehyde with a multisubstituted phenol, 2-methylresorcinol and m-cresol.
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