发明名称 |
Compound semiconductor device and production method thereof. |
摘要 |
<p>A compound semiconductor device including a field effect transistor particularly suited for high frequency applications such as grounded source applications. An active layer (2) is formed on one surface of a compound semiconductor substrate (1). An aperture (6) is dry etched through the second surface of the semiconductor substrate toward the first surface, and terminates in the source region (4a) of the active layer (2). The walls (7) of the aperture are metallized as is the second surface of the substrate. A gate electrode (3) and at least a drain electrode (5) are formed on the first surface. The metallized second surface can act as a source electrode by virtue of ohmic contact between the metallized walls of the aperture and the source region of the active layer.</p> |
申请公布号 |
EP0432948(A2) |
申请公布日期 |
1991.06.19 |
申请号 |
EP19900313071 |
申请日期 |
1990.11.30 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
HIGAKI, YUKIO, C/O MITSUBISHI DENKI K. K. |
分类号 |
H01L21/3213;H01L21/338;H01L29/40;H01L29/417;H01L29/812 |
主分类号 |
H01L21/3213 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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