发明名称 METHOD AND APPARATUS FOR INSPECTING THIN-FILM TRANSISTOR ACTIVE MATRIX SUBSTRATE
摘要 <p>PURPOSE:To make rapid detection with a change in the optical characteristics of a liquid crystal layer by disposing a thin-film transistor active matrix substrate and microcapsulated liquid crystals to face each other and impressing voltages to the scanning lines and signal lines of the above-mentioned thin-film substrate. CONSTITUTION:The TFTR active matrix substrate to be used for inspection is formed on a glass substrate 12 by the plural scanning lines 8, signal lines 9 and TFTRs 10. All the scanning lines 5 and signal lines 6 are electrically connected by wirings 13 for inspection in order to allow inspection in a short period of time. This electrical connection may be executed by dividing the lines block by block. Discoloration arises in a chiral nematic liquid crystal layer 3 on the short circuited defect part of the scanning lines 8 and the signal lines 9 when a prober 7 is applied to terminals 14 for probing of this TFTR active matrix substrate and the voltages are impressed between the scanning lines 8 and the signal lines 9. The positions of the short circuit defect part where the defect exists and the defect does not exist are thus easily visually detected.</p>
申请公布号 JPH03142498(A) 申请公布日期 1991.06.18
申请号 JP19890279682 申请日期 1989.10.30
申请人 HITACHI LTD 发明人 NAKATANI MITSUO;YORITOMI YOSHIFUMI;KOSHIMO TOSHIYUKI;KUBOTA HITOSHI;IWATA HISAFUMI
分类号 G01R31/00;G01R31/308;G02F1/136;G02F1/1368;G09G3/36 主分类号 G01R31/00
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