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发明名称
Exposure method and exposure apparatus
摘要
申请公布号
US5025284(A)
申请公布日期
1991.06.18
申请号
US19900577632
申请日期
1990.09.05
申请人
HITACHI, LTD.
发明人
KOMORIYA, SUSUMU;NISHIZUKA, HIROSHI;NAKAGAWA, SHINYA;MAEJIMA, HISASHI
分类号
H01L21/30;G03F7/20;G03F7/207;H01L21/027
主分类号
H01L21/30
代理机构
代理人
主权项
地址
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