| 摘要 |
PURPOSE:To reduce risk, to prevent aged deterioration in release-power and to acquire release effect to a photoresist of both positive and negative by containing a specified rate of a specified halobenzenesulfonic acid and phenole compound, respectively. CONSTITUTION:Halobenzenesulfonic acid expressed in an expression (I) is contained by 1 to 20wt.% and phonole compound is contained by 5 to 50wt.%. In the expression (I), X expresses halogen atom such as fluorine atom, chlorine atom, bromine atom, and iodine atom; a compound which expresses chlorine atom is preferable in respect of cost. A mix ratio of halobenzenesulfonic acid is preferably 1 to 10wt.%. Phenole, xylenol, cresol, etc., are especially preferably as phenole compound; a mix ratio thereof is preferably 10 to 40wt.%. Although it does not contain chlorine solvent whose use is largely restricted, it is the equal of a conventional one from the viewpoint of release-power and hardly corrode metal such as aluminum. |
