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发明名称
MASK AND CHARGED PARTICLE BEAM EXPOSURE METHOD USING THE MASK
摘要
申请公布号
EP0367126(A3)
申请公布日期
1991.06.12
申请号
EP19890119949
申请日期
1989.10.27
申请人
FUJITSU LIMITED
发明人
SAKAMOTO, KIICHI
分类号
H01L21/30;G03F1/14;G03F1/16;H01L21/027;(IPC1-7):G03F1/14
主分类号
H01L21/30
代理机构
代理人
主权项
地址
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