| 摘要 |
<p>This invention is directed to a method of copper-nickel-chromium bright electroplating which provides excellent corrosion resistance, characterized in that said bright electroplating film comprising a copper and a nickel plating layers formed on a basis material or a nickel plating layer directly formed on a basis material, a microporous layer of a thickness of 0.2-2 mu m codeposited on said nickel plating layer by adding calcium salt and titanium oxide to Watts bath type of nickel plating bath, chromium plating layer with a thickness of 0.01-0.25 mu m on said microporous layer and a chromium plating surface with micropores of 20000-500000/cm<2>, and is directed to the plating films obtained by the method.</p> |
