发明名称 Device for generating X-radiation with a plasma source
摘要 The invention is an improvement in a device for generating X-radiation with a plasma source. In the device, two concentric cylindrical electrodes (11, 12) are separated by an evacuated discharge space (13) filled with low-pressure gas. When the inner electrode is momentarily raised to an extremely high voltage, the gas is ionized and a plasma shock wave (17, 17') is created and compressed into a plasma focus (21) emitting X-radiation (20). The improvement introduces a first ("discharge") gas into the discharge space for initiation of the plasma, while introducing a second ("emitting") gas into the inner electrode for generating the X-radiation in the plasma focus. Special features of the improved device include a plurality of gas extraction ports, which can be used independently or together, and which can be combined with variations in the introduction and flow of the two gases to control the movement and intermixture of the gases and, thereby, the operation of the device. Also, the device introduces a third gas for improving the transmission of the X-radiation from the generating plasma focus to a work station for X-ray microscopy or for X-ray lithography.
申请公布号 US5023897(A) 申请公布日期 1991.06.11
申请号 US19900568193 申请日期 1990.08.16
申请人 CARL-ZEISS-STIFTUNG 发明人 NEFF, WILLI;HOLZ, RAYMOND;LEBERT, RAINER;RICHTER, FRANZ
分类号 H05H1/48;G03F7/20;H05G2/00;H05H1/24 主分类号 H05H1/48
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