发明名称 LITHOGRAPHIC TECHNIQUE USING LASER SCANNING FOR MANUFACTURING ELECTRONIC COMPONENT, ETC.
摘要 PURPOSE: To obviate the occurrence of undercuts by executing irradiation with a laser by scanning of plural sets of work pieces and executing the irradiation of the ensuing respective sets in superposition on the immediate previous sets including plural times of scanning that the respective sets cross the allocated regions of the work pieces. CONSTITUTION: Masks 15 of reflective materials at the wavelength of the lasers 26 to be used are arranged on the surfaces of the work pieces 10 and are then irradiated with the lasers 16, by which the unmasked work piece materials are removed. Etching is executed by immersing the work pieces 10 into a liquid bath transparent to the laser radiation 16. In such a case, a laser scanning protocol on one surface includes a stage for exposing the surface of the material to the laser radiation 16 of the certain pattern through a reflective mask layer 15 and removing the material corresponding to openings 20 to allow the material of the certain pattern to remain. The laser radiations 16 are impressed by irradiation of plural overlaps in order to complete the perfect scanning to cross the work pieces 10. After the scanning of the sets, the scanning of the ensuing respective sets is executed in superposition on the preceding sets. As a result, the rapid removal of the unnecessary materials is made possible and the occurrence of the undercuts is averted.
申请公布号 JPH03135568(A) 申请公布日期 1991.06.10
申请号 JP19900161186 申请日期 1990.06.19
申请人 DIGITAL EQUIP CORP <DEC> 发明人 SHIYAIAMU CHIYANDORA DASU;JIYAMARUDEIN KAAN
分类号 B23K26/00;G03F7/20;G11B5/31;H01L21/027;H01L21/30 主分类号 B23K26/00
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