Sputter coating apparatus - with target exchange chamber capable of being evacuated when target is to be replaced thereby avoiding removal of vacuum in coating chamber

摘要

Sputter coating apparatus consists of a vacuum chamber (1) in which the coating process takes place and a target exchange chamber which is separated from the vacuum chamber by the target electrode support surface when it is in its raised position. When the target is to be changed, a vacuum is created in the exchange chamber prior to opening the separation wall as the target electrode is lowered. USE/ADVANTAGE - The target can be frequently changed without removing the vacuum in the sputter chamber. There is no new start-up time required.