发明名称 Arrangement for object photogrammetric measurement - has sensors and camera with positioning no adversely affected by reference pattern image formation
摘要 The arrangement contains two individually positionable optical sensors (5-7), associated projection centres in defined relative spatial positions and an optical reference pattern (14) on the object space side. The reference pattern is placed outside the imaging beam path (11-13) between the object and the sensors. Optical deflectors (15-17) in defined positions wrt. the sensors form images of the reference pattern. USE/ADVANTAGE - Positioning wrt. object of sensors and cameras contg. projection centres is not adversely affected by reference pattern image formation.
申请公布号 DE4037273(A1) 申请公布日期 1991.06.06
申请号 DE19904037273 申请日期 1990.11.23
申请人 VOLKSWAGEN AG, 3180 WOLFSBURG, DE 发明人 WITTWER, WILLY ING.(GRAD.), 3180 WOLFSBURG, DE
分类号 G01C15/00;G01B11/00;G01B11/24;G01B11/245;G01C11/02 主分类号 G01C15/00
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