发明名称 |
Arrangement for object photogrammetric measurement - has sensors and camera with positioning no adversely affected by reference pattern image formation |
摘要 |
The arrangement contains two individually positionable optical sensors (5-7), associated projection centres in defined relative spatial positions and an optical reference pattern (14) on the object space side. The reference pattern is placed outside the imaging beam path (11-13) between the object and the sensors. Optical deflectors (15-17) in defined positions wrt. the sensors form images of the reference pattern. USE/ADVANTAGE - Positioning wrt. object of sensors and cameras contg. projection centres is not adversely affected by reference pattern image formation. |
申请公布号 |
DE4037273(A1) |
申请公布日期 |
1991.06.06 |
申请号 |
DE19904037273 |
申请日期 |
1990.11.23 |
申请人 |
VOLKSWAGEN AG, 3180 WOLFSBURG, DE |
发明人 |
WITTWER, WILLY ING.(GRAD.), 3180 WOLFSBURG, DE |
分类号 |
G01C15/00;G01B11/00;G01B11/24;G01B11/245;G01C11/02 |
主分类号 |
G01C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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