发明名称 VERFAHREN ZUR GALVANISCHEN DIREKTMETALLISIERUNG
摘要 The invention relates to a process for galvanic deposition on the surface of non-conductors without previously coating them with metal from chemically reductive baths for the purposes of making metal coatings or through hole-plated printed circuit boards in which the following steps are taken: pre-cleaning, possibly etching or wetting the surface to be metallised; coating the surface with an adhesion agent; adsorption of a metal compound; reduction of the metal compound to metal; galvanic metallisation.
申请公布号 DE3940407(A1) 申请公布日期 1991.06.06
申请号 DE19893940407 申请日期 1989.12.04
申请人 SCHERING AG, 1000 BERLIN UND 4709 BERGKAMEN, DE 发明人 MIDDEKE, HERMANN-JOSEF, DIPL.-CHEM. DR.;MAJENTNY, KLAUS, 1000 BERLIN, DE
分类号 C23C18/28;C25D5/54;C25D5/56;H05K3/42 主分类号 C23C18/28
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