发明名称 Semiconductor heterostructure and method of producing the same.
摘要 <p>A semiconductor device comprises a crystalline substrate layer and a GaAs or GaAs-containing compound formed on the substrate layer, a Ge or Ge-containing crystalline layer being formed as an intermediate layer within the GaAs of GaAs-containing compound layer.</p>
申请公布号 EP0430562(A1) 申请公布日期 1991.06.05
申请号 EP19900312664 申请日期 1990.11.20
申请人 FUJITSU LIMITED 发明人 TAKASAKI, KANETAKE
分类号 H01L29/267;H01L29/205;H01L21/20;H01L21/205 主分类号 H01L29/267
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