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发明名称
METHOD FOR CLEANING CHAMBER OF VAPOR REACTION DEVICE
摘要
申请公布号
JPH03126873(A)
申请公布日期
1991.05.30
申请号
JP19890262976
申请日期
1989.10.11
申请人
HITACHI ELECTRON ENG CO LTD
发明人
OYAMA KATSUMI
分类号
C23C16/44;C23C16/50;C23F4/00
主分类号
C23C16/44
代理机构
代理人
主权项
地址
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