| 摘要 |
<p>PURPOSE:To set the conditions of optimum atomization by providing a rotor which discharges supplied coating by rotation in a thin film shape, a gas flow device for atomizing the thin film-like coating and a regulator of the injection angle of the injected gas flow for the rotary axial center. CONSTITUTION:The gas emitted from an injecting gas flow feeder is allowed to collide against a blade member 25 by actuation of an electrostatic coating device. Therefore the member 25 is rotated to the direction shown in an arrow 90 and also an axial member 23 fixed to the member 25 is rotated. Furthermore a cup 3 fixed to the end part 27 thereof is rotated. Simultaneously coating 5 emitted from the tip part 91 of a coating feeder 7 is stuck on the whole region of the inner circumferential face 86 of the cup 3 and made film-like and discharged from the tip part 87 of an inner cup member 44. Simultaneously the high-pressure gas flow emitted from a high-pressure gas generator is led to the gap 53 between the outer circumferential face of the inner cup and the inner circumferential face of an outer cup and then discharged form the space 89 between the tip parts 87, 88 of both cup members. The thin film-like coating 5 supplied form the tip part 87 is atomized by this high-pressure gas flow and attracted by the high electric field of a high voltage generator and surely stuck to the material to be coated.</p> |
