ANIONICALLY POLYMERIZABLE MONOMERS, POLYMERS THEREOF, AND USE OF SUCH POLYMERS IN PHOTORESISTS

摘要

Anionically polymerizable monomers containing at least one silicon or titanium atom for polymeric photoresists for use in microlithography. The monomers are of formula (I), wherein A is -H or -CH=CH2; X is a strong electron withdrawing group; Y is a strong electron withdrawing group containing at least one silicon or titanium atom. Preferably Y is (II), wherein n is 1-5 and R<2>, R<3> and R<4> are C1-C10 alkyl. A particularly preferred monomer is 3-trimethylsilylpropyl 2-cyanoacrylate. Methods for applying a resist coating by vapour deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed. The imaging layer may be applied over a planarizing layer to form a multilayer photoresist.