| 摘要 |
PURPOSE:To improve the contrast of a projected optical image for transfer mask patterns of various shapes and to form a resist pattern excellent in cross- selectional shape by using a phase shift mask arranged directly next to at least one of transmissive areas so that lights which have passed through a mask differ by about 180 deg. from each other in phase. CONSTITUTION:A pair of light transmitting areas is provided; the pair is arranged so that both the areas are in contact with each other; at least one of them is provided with a means 12 for making lights which have passed through their respective light transmitting areas almost 180 deg. different from each other in phase. In this case, the phase of the light which has passed through the light transmitting area and that of the light which has passed through a phase shifter are offset by shifting the phases almost 180 deg. from each other, at their boundary part; consequently light intensity is extremely decreased. That is, the light-shielding effect which is far more intense can be obtained in such a mask. Thus, a satisfactory optical image of high contrast can obtained for an arbitrary linear pattern. |
