发明名称 Positive type radiation-sensitive resin composition comprising a photosensitizer and a novolak resin
摘要 A positive type radiation-sensitive resin composition comprising an alkali-soluble novolac resin and a 1,2-quinonediazide compound, characterized in that said alkali-soluble novolac resin is a resin produced by condensing a carbonyl compound and a phenol mixture comprising 6 to 94 mole % of m-cresol and 94 to 6 mole % of at least one compound represented by the formula (I) other than m-cresol: <IMAGE> (I) wherein X is -CH3, -C2H5, -C(CH3)3, -CO2CH3 or -CO2C2H5; n is an integer satisfying 3>/=m>/=1; and m is an integer satisfying 3>/=m>/=1, in which resin when the polystyrene-reduced molecular weight is determined by a gel permeation chromatography using a monodisperse polystyrene as the standard, maximum values a, b and c present, respectively, in the molecular weight ranges of 6,300 to 25,000, 2,500 to 6,000 and 150 to 900 in the molecular weight distribution curve obtained satisfy the following relationships: a/b=0-1.5 and c/b=1.4-2. Said positive type-radiation-sensitive resin composition is excellent in resolution, sensitivity, developability, thermal resistance and adhesion and hence is useful as a positive type resist for producing integrated circuits having a higher integration.
申请公布号 US5019479(A) 申请公布日期 1991.05.28
申请号 US19890373592 申请日期 1989.06.30
申请人 JAPAN SYNTHETIC RUBBER CO., LTD. 发明人 OKA, HIROSHI;OKUDA, CHOZO;YOSHIDA, YOSHINORI;TAKAHASHI, TOSHIHIKO;KAMOSHIDA, YOICHI;MIURA, TAKAO
分类号 G03F7/023 主分类号 G03F7/023
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