发明名称 X-RAY MASK AND MANUFACTURE THEREOF
摘要 <p>PURPOSE:To keep a high position accuracy by using a membrane which consists of a lower layer having enough tensile stress for self-supporting and a lower layer having only a negligibly small stress in comparison with that of the lower layer. CONSTITUTION:A membrane has a lower layer 1 and an upper layer 2; a tensile stress 3 is formed in the lower layer 1, which is strong enough for self-supporting and only a negligibly small stress in comparison with the tensile stress 3 of the lower layer 1 is produced in the upper layer 2. A mask pattern is formed on the membrane by a material which absorbs X-ray to manufacture an X-ray mask. In manufacture of the membrane, after a membrane 1 having enough tensile stress is manufactured, ion implantation is carried out to a surface part of the membrane 1. The upper layer 2 whereto ion implantation is carried out becomes a film having a small stress. Thereby, a high position accuracy can be kept.</p>
申请公布号 JPH03124016(A) 申请公布日期 1991.05.27
申请号 JP19890262451 申请日期 1989.10.06
申请人 FUJITSU LTD 发明人 YAMADA MASAO
分类号 G03F1/22;G03F1/60;H01L21/027;H01L21/30 主分类号 G03F1/22
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