发明名称 |
Elliptical ion beam distribution method and apparatus. |
摘要 |
<p>An ion source (10) for creating an ion beam. The source includes an ionization chamber (16) having one wall that defines a generally elliptical opening (50) for allowing ions to exit the ionization chamber. Use of an elliptical (in section) ion beam has advantages over a rectangular ion beam which allow the integrity of a relatively high current ion beam to be maintained as ions travel to a beam treatment workstation. A dual configuration extraction electrode assembly (20) also provies for a range of extraction energies from a single source.</p> |
申请公布号 |
EP0428319(A2) |
申请公布日期 |
1991.05.22 |
申请号 |
EP19900312164 |
申请日期 |
1990.11.07 |
申请人 |
EATON CORPORATION |
发明人 |
BENVENISTE, VICTOR MAURICE |
分类号 |
H01J27/08;H01J27/20;H01J37/08;H01J37/317;H01L21/265 |
主分类号 |
H01J27/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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