发明名称 Elliptical ion beam distribution method and apparatus.
摘要 <p>An ion source (10) for creating an ion beam. The source includes an ionization chamber (16) having one wall that defines a generally elliptical opening (50) for allowing ions to exit the ionization chamber. Use of an elliptical (in section) ion beam has advantages over a rectangular ion beam which allow the integrity of a relatively high current ion beam to be maintained as ions travel to a beam treatment workstation. A dual configuration extraction electrode assembly (20) also provies for a range of extraction energies from a single source.</p>
申请公布号 EP0428319(A2) 申请公布日期 1991.05.22
申请号 EP19900312164 申请日期 1990.11.07
申请人 EATON CORPORATION 发明人 BENVENISTE, VICTOR MAURICE
分类号 H01J27/08;H01J27/20;H01J37/08;H01J37/317;H01L21/265 主分类号 H01J27/08
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