| 摘要 |
The curing method of coating resin for transistor contains the pre-curing process of the coating resin by flowing and humidifying with pure H2O andnitrogen gas (N2) before curing on the high temp. oven. The said curing method is useful in the preparation of transistor for high voltage. In the fig., 1= trasistor, 4= resin, 5= placing part, 6= water tank, 9= nitrogen gas feeding pipe, 10= flowing and humidifying pipe.
|
