发明名称 VERFAHREN ZUM VERBINDEN EINES SILIZIUMTEILES MIT EINEM GLASTEIL
摘要 <p>In order to be able to produce inexpensively the bond between a glass component and a silicon component in the manufacture of sub-assemblies in the planar-optics and/or micromechanics fields, the use of so-called anodic-bonding techniques calls for the glass component to be conventional flat glass, hardened, before bonding to the silicon component, in a salt bath, thus generating compressive stresses in the surface penetrating to a maximum depth of 20-40 mu m. These compressive stresses compensate for the tensile stresses produced by the bonding process.</p>
申请公布号 DE3937529(A1) 申请公布日期 1991.05.16
申请号 DE19893937529 申请日期 1989.11.08
申请人 SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN, DE 发明人 HOUDEAU, DETLEF, DIPL.-ING.;SCHLAAK, HELMUT, DR.;ZHANG, JUN-MING, DIPL.-ING., 1000 BERLIN, DE
分类号 C03C27/00;C04B37/04 主分类号 C03C27/00
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