摘要 |
In known devices for reducing the concentration of field lines in an electroplating plant for treating disk-shaped workpieces, a diaphragm is associated with a lower end region of a workpiece. Such a diaphragm, which is moved together with the workpiece in an electrolytic bath, can be used only in vertical electroplating plants and its shape or size cannot be adapted to the shape and size of a workpiece to be treated. The invention relates to a diaphragm device (6) with one or more diaphragms (7) which are associated with one of the faces of the anode (1) facing the workpiece (2) such that the concentration of field lines (4) between the anode (1) and the workpiece (2) can be reduced, completely or partly, in a predetermined manner.
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申请人 |
SCHERING AG, 1000 BERLIN UND 4709 BERGKAMEN, DE |
发明人 |
KALLWEIT, MANFRED;MEYER, WALTER, 1000 BERLIN, DE;SCHROEDER, ROLF, DIPL.-ING. (FH), 8501 BURGTHANN, DE |