| 摘要 |
Polyamide, polyurea, polyhydrazide, and polyurethane materials having substantially modified surfaces which are antimicrobial are disclosed. The disclosure also relates to selective ultraviolet (UV) photon irradiation, high energy electron irradiation low energy electron irradiation and chemical reducing processes for preparing such antimicrobial, polymeric materials. The disclosure further provides methods for controlling microorganisms, and products made from the antimicrobial, polymeric materials of this invention. |
| 申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
COHEN, JEFFREY, D.;ERKENBRECHER, CARL, JR.;HAYNIE, SHARON, L.;KELLEY, MICHAEL, JOHN;KOBSA, HENRY;ROE, ARTHUR, NICHOLAS;SCHOLLA, MICHAEL, H. |
