| 摘要 |
<p>A main plasma gun l2 effects melting, powder deposition, etc. at the target l4. Power supply l6 renders the target positive relative to the cathode 28 of the gun l2. Auxiliary power supply 58 coupled between anode 24 and cathode 28 provides a pilot arc and there is a high-frequency starter coil 64. A clean-up gun 34 is coupled to the target l4 by power supply 50 which makes the target negative with respect to the gun 34. The second transfer arc 56 thus has ion flow in a direction opposite to that of the main transfer arc 48. Oxides are thus removed by the second arc 56 during processing by the main arc 48.</p> |
