发明名称 |
MICRO REPLICATION PROCESS |
摘要 |
MICRO REPLICATION PROCESS A method of replicating a master micropattern comprising coating the master micropattern with a layer of a radiation curable composition comprising as the radiation curable component, a compound having the structure I wherein R represents a cycloaliphatic or an aromatic group; R1 represents ; CH2CH2OCH2CH2- or ; R2 represents hydrogen or methyl; n is 2 to 10; p is 3 or 4; and exposing the layer to actinic radiation thereby forming a negative microimage of the master micropattern in the layer. |
申请公布号 |
CA1284126(C) |
申请公布日期 |
1991.05.14 |
申请号 |
CA19860500386 |
申请日期 |
1986.01.27 |
申请人 |
KAPLAN, MARK S. |
发明人 |
KAPLAN, MARK S.;MOLAIRE, MICHEL F. |
分类号 |
G03F7/004;G11B7/26 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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