发明名称 MICRO REPLICATION PROCESS
摘要 MICRO REPLICATION PROCESS A method of replicating a master micropattern comprising coating the master micropattern with a layer of a radiation curable composition comprising as the radiation curable component, a compound having the structure I wherein R represents a cycloaliphatic or an aromatic group; R1 represents ; CH2CH2OCH2CH2- or ; R2 represents hydrogen or methyl; n is 2 to 10; p is 3 or 4; and exposing the layer to actinic radiation thereby forming a negative microimage of the master micropattern in the layer.
申请公布号 CA1284126(C) 申请公布日期 1991.05.14
申请号 CA19860500386 申请日期 1986.01.27
申请人 KAPLAN, MARK S. 发明人 KAPLAN, MARK S.;MOLAIRE, MICHEL F.
分类号 G03F7/004;G11B7/26 主分类号 G03F7/004
代理机构 代理人
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