| 摘要 |
<p>PURPOSE:To prevent the generation of cracks to cause breakdown by constituting an electrostatic chuck of a metal ring shrink-fitted to the periphery of a base body, and screwing the chuck to a cooling means installed on a detachable fixing member so as to be free from water leak. CONSTITUTION:An electrostatic chuck is constituted by shrink-fitting a metal ring 5 to a ceramic base body 2 capable of sucking a silicon water 3. A fixing member 4 is equipped with a groove 8, and the chuck can be fixed on the member 4 with screws 7 outside the groove 8. A cooling means 6 capable of making cooling water flow in the groove 8 is constituted. When processing is performed by heating the chuck 1, that is, by heating the wafer 3, the means 6 is used in order to cool the ring 5 and prevent the decrease of compression stress applied to the base body 2.</p> |
