发明名称 Work-table for semiconductor processing clean room - controls air flow vertically on to table to prevent air turbulence
摘要 The work surface (16) of the table (10) is provided with holes (14) which go through to underside of work surface (16) to link with channels (20) which further connect to extractor channels (24) located near the floor. An airflow (25) is then directed perpendicular to work surfaces (16) through channels (20,24) to avoid turbulence or cross flow of air. Pref., the table (10) includes a recess (42) for operators legs. USE - Clean room environment esp. semi-conductor wafer processing.
申请公布号 DE3936815(A1) 申请公布日期 1991.05.08
申请号 DE19893936815 申请日期 1989.11.06
申请人 PRETTL, ROLF, 7400 TUEBINGEN, DE 发明人 DOEMENY, ISTVAN, 7300 ESSLINGEN, DE
分类号 B08B15/04;F24F3/16 主分类号 B08B15/04
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