发明名称 |
A chemical vapor deposition process to replicate the finish and/or figure of preshaped structures. |
摘要 |
<p>A process is disclosed by which the finish and/or figure of polished preshaped structures (such as mirrors) can be replicated directly by chemical vapor deposition, with only minor polishing of the replica (18) being required to obtain a final product, and with the original substrate (12) being reusable for further replication. Relevant conditions under which the process can be carried out are given. Featured in the process is a pretreatment step prior to the deposition of a layer of silicon carbide to form the replica, which pretreatment step involves the formation on the polished substrate of an oxide layer and a carbon layer (16) of high finish and uniform thickness. The carbon layer allows easy separation of the substrate and replica which otherwise would be bound together.</p> |
申请公布号 |
EP0425196(A1) |
申请公布日期 |
1991.05.02 |
申请号 |
EP19900311459 |
申请日期 |
1990.10.18 |
申请人 |
CVD INCORPORATED |
发明人 |
TAYLOR, RAYMOND L.;PICKERING, MICHAEL A.;KEELEY, JOSEPH T. |
分类号 |
C23C16/22;C23C16/01;C23C16/26;C23C16/32;C23C16/44 |
主分类号 |
C23C16/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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