发明名称 A chemical vapor deposition process to replicate the finish and/or figure of preshaped structures.
摘要 <p>A process is disclosed by which the finish and/or figure of polished preshaped structures (such as mirrors) can be replicated directly by chemical vapor deposition, with only minor polishing of the replica (18) being required to obtain a final product, and with the original substrate (12) being reusable for further replication. Relevant conditions under which the process can be carried out are given. Featured in the process is a pretreatment step prior to the deposition of a layer of silicon carbide to form the replica, which pretreatment step involves the formation on the polished substrate of an oxide layer and a carbon layer (16) of high finish and uniform thickness. The carbon layer allows easy separation of the substrate and replica which otherwise would be bound together.</p>
申请公布号 EP0425196(A1) 申请公布日期 1991.05.02
申请号 EP19900311459 申请日期 1990.10.18
申请人 CVD INCORPORATED 发明人 TAYLOR, RAYMOND L.;PICKERING, MICHAEL A.;KEELEY, JOSEPH T.
分类号 C23C16/22;C23C16/01;C23C16/26;C23C16/32;C23C16/44 主分类号 C23C16/22
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