| 发明名称 |
Process for forming deposited film by use of alkyl aluminum hydride. |
| 摘要 |
<p>A process for forming an Al film of good quality according to the CVD method utilizing the reaction between alkyl aluminum hydride and hydrogen, which is an excellent deposited film formation process also capable of selective deposition of Al.</p> |
| 申请公布号 |
EP0425084(A1) |
申请公布日期 |
1991.05.02 |
| 申请号 |
EP19900309800 |
申请日期 |
1990.09.07 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MIKOSHIBA, NOBUO;TSUBOUCHI, KAZUO;MASU, KAZUYA |
| 分类号 |
C23C16/20;H01L21/285 |
主分类号 |
C23C16/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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