| 发明名称 |
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| 摘要 |
PURPOSE:To make the width of a slot of a mask to be made large some extent and improve vertical magnetic characteristics by fixing an incident angle of an evaporation stream against a supporting material surface within a predetermined narrow range. CONSTITUTION:A high polymer film as a supporting material 1 is paid off from one roller 3 and laid along a cooling drum 2 and taken up by another roller 4. A mask 5 is provided between the drum 2 and a crucible 6 and a slit 7 is opened in the mask 5 on a center line Z connecting the center of the drum 2 and the center of the crucible 6. A deposition material S is contained in the crucible 6 and the material S is irradiated by an electron beam EB. The material S is heated and evaporated by the irradiation and incides against the surface of the supporting material 1 through the slit 7. The irradiation point of the electron beam EB is scanned along the width direction of the supporting material 1 only and at the same time the crucible 6 is moved along the running direction of the supporting material 12 while the deposition is carried out and the vertical magnetic characteristics of the supporting material 1 is improved. |
| 申请公布号 |
JPH0330971(B2) |
申请公布日期 |
1991.05.01 |
| 申请号 |
JP19830128191 |
申请日期 |
1983.07.13 |
| 申请人 |
TAIYO JUDEN KK;EIKOO ENJINIARINGU KK |
发明人 |
TATSUNO TETSUO;ARIKAWA SETSU;TAKAHASHI HIROSHI;INOE KIKUO;HIROCHI FUJIO |
| 分类号 |
G11B5/66;C08L67/02;C23C14/30;G11B5/64;G11B5/73;G11B5/85;H01F41/20 |
主分类号 |
G11B5/66 |
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