发明名称 Semiconductor integrated circuit and a process for producing the same
摘要 The impurity concentration in a channel stopper in contact with a second fine active area is selected to be lower than the impurity concentration in a first active area that is wider than the second active area. This prevents the impurity concentration in the second active area from excessively rising that is caused by the diffusion of impurities when the insulating film for isolation is being formed, and helps improve characteristics and reliability of fine semiconductor device formed in the second active area.
申请公布号 US5012312(A) 申请公布日期 1991.04.30
申请号 US19880261843 申请日期 1988.10.25
申请人 HITACHI, LTD. 发明人 KAWAMOTO, YOSHIFUMI
分类号 H01L21/76;H01L21/762;H01L27/02;H01L27/10;H01L29/06;H01L29/78 主分类号 H01L21/76
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